発行年月 | タイトル | 第一著者 | 共著者 | 会議名 | 開催場所 | 備考 | |
06-01 | 2006年3月 | Measurement of in-plane and depth profiles of strain in strained-Si substrates | D. Kosemura | K. Yamasaki, S. Tanaka, and A. Ogura | Second Workshop of the Thematic Network on Silicon on Insulator technology, devices and circuits | Grenoble, France | |
06-02 | 2006年5月 | Discussion on Issues Toward 450mm Wafer | M. Watanabe | T. Fukuda, A. Ogura, Y. Kirino and M. Kohno | Silicon Materials Science and Technology Simposium X, 209th Meeting of The Electrochemical Society | Denver, Colorado | Invited |
06-03 | 2006年7月 | Chemical Vapor Deposition of NiSi using Ni(PF3)4 and Si3H8 | M. Ishikawa | I. Muramoto, H. Machida, S. Imai, Y. Ohshita and A, Ogura | Asia-Pacific Conference on Semiconducting Silicides | Kyoto | |
06-04 | 2006年8月 | Strain engineering and evaluation in advanced LSI technology | A. Ogura | 20th International Conference on Raman Spectroscopy | Yokohama | Invited | |
06-05 | 2006年9月 | Photoluminescence characterization of defects in multi-crystalline silicon wafers | H. Sugimoto | M. Inoue, M. Tajima, Y. Ohshita, and A. Ogura | 21st European Photovoltaic Solar Energy Conference |
Dresden, Germany | |
06-06 | 2006年9月 | W-CVD using biscyclopentadienyltungsten system | S. Imai | T. Kagawa, H. Kurozaki, A. Ogura, M. Ishikawa, I. Muramoto, H. Machida, and Y. Ohshita | Advanced Metallization Conference, Asian Session | Tokyo | |
06-07 | 2006年9月 | Properties of chemical reaction during Ni and Ni-silicide deposition using Ni(PF3)4 and Si3H8 | M. Ishikawa | I. Muramoto, H. Machida, S. Imai, A. Ogura, Y. Ohshita | Advanced Metallization Conference, Asian Session | Tokyo | |
06-08 | 2006年10月 | Evaluation of SOI substrates with local or global strain by means of in-plane XRD measurement | Daisuke Kosemura, | Kosuke Yamasaki, Satoshi Tanaka, Yasuto Kakemura, Tetsuya Yoshida, and Atsushi Ogura | IEEE International SOI Conference | Niagara Falls | |
06-09 | 2006年10月 | W-CVD using biscyclopentadienyltungsten system | S. Imai | T. Kagawa, H. Kurozaki, A. Ogura,M. Ishikawa, I. Muramoto, H. Machida, and Y. Ohshita | Advanced Metallization Conference, US Session | San Diego | |
06-10 | 2006年11月 | Evaluation of polycrystalline silicon for solar-cells by small p-n diode array | S. Tanaka | K. Imai, A. Ogura, K. Arafune, H. Kawai, F. Kusuoka, Y. Ohshita, M. Inoue,.M. Tajima | Fall Meeting of The Material research Society | Boston | |
06-11 | 2006年11月 | SiO2/Si Interfacial Lattice Strain Revealed by Extremely Asymmetric X-ray Diffraction | H. Yoshida | K. Akimoto, Y. Ito, T. Emoto, N. Yamamoto, Y. Oshita, A. Ogura | 2006 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ULSI DEVICES: SCIENCE AND TECHNOLOGY | Kawasaki | |
06-12 | 2006年11月 | X-ray photoelectron spectroscopy study on SiO2 formed on several orientated c-Si in high pressure water vapor | N. Yamamoto | S. Tanaka, H. Sai, R. Imai, E. Ikenaga, I. Hirosawa, Y. Oshita, and A. Ogura | 2006 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ULSI DEVICES: SCIENCE AND TECHNOLOGY | Kawasaki |