国際会議 その1 (2008〜2009年)

発行年月 タイトル 第一著者 共著者 会議名 開催場所 備考
08-01 2008年1月 Evaluation of super-critical thickness strained-Si
on insulator (sc-SSOI) substrate		 T. Yoshida D. Kosemura, Y. Kakemura, M. Takei, H. Saito, A. Ogura, T. Shimura, T. Koganesawa, and I. Hirosawa
Fourth Workshop of the Thematic Network on Silicon on Insulator Technology, Devices and Circuits		 Irland
08-02 2008年5月 Evaluation of local starin in Si using UV-Raman spectroscopy A. Ogura D. Kosemura, Y. Kakemura, T. Yoshida, Euro-MRS 2008, Symposium on Advanced Silicon Materials Research for Electronic and Photovoltaic Applications, France Inveited
08-03 2008年5月 Evaluation and control of strain in Si induced by patterned SiN stressor H. Saitoh M. Takei, A. Ogura, T. Koganezawa, I. Hirosawa, M. Kohno, T. Nishita, and T. Nakanish 213th Electrochemical Society Meeting Phenix
08-04 2008年5月 Chemical Vapor deposition using Pt(PF3)4 and Ni(PF3)4 M. Ishikawa I. Muramoto, H. Machida, S. Imai, A. Ogura, and Y. Ohshita 213th Electrochemical Society Meeting Phenix
08-05 2008年5月 Application of Synchrotron X-ray Diffraction T. Shimura, T. Inoue, Y. Okamoto, T. Hosoi, A. Ogura, O. Sakata, S. Kimura, H. Edo, S. Iida, and H. Watanabe 213th Electrochemical Society Meeting Phenix
08-06 2008年5月 Transconductance Enhancement by Utilizing Pattern Dependent Oxidation in Silicon Nanowire Field-Effect Transistors A. Seike T. Tange, I. Sano, Y. Sugiura, I. Tsuchida, H. Ohta, T. Watanabe, D. Kosemura, A. Ogura and I. Ohdomari 213th Electrochemical Society Meeting Phenix
08-07 2008年6月 Channel-Stress Study on Gate-Size Effects for Damascene-Gate pMOSFETs with Top-Cut Compressive Stress Liner and eSiGe S. Mayuzumi S. Yamakawa, D. Kosemura, M. Takei, J. Wang, T. Ando, Y. Tateshita, M. Tsukamoto, H. Wakabayashi, T. Ohno, A. Ogura and N. Nagashima 2008 Symposium on VLSI Technology and circuit Hawaii
08-08 2008年8月 Evaluation of multi-crystalline silicon substrates with p-n diode array T. Tachibana K. Imai, J. Masuda, A. Ogura, K. Arafune, Y. Ohshita, and M. Tajima 18th Workshop on Crystalline Silicon Solar Cells & Modules: Materials and Processes Denver
08-09 2008年8月 High Spatial Resolution Evaluation of Strain in High-Performance Si MOSFET by UV-Raman Spectroscopy D. Kosemura M.Takei, T. Yoshida, Y. Kakemura, A. Ogura, R. Shimidzu 21th International Conference on Raman Spectroscopy London Guraduate Student Award
08-10 2008年9月 Study of Stress Effect on Replacement Gate Technology with Compressive Stress　Liner and eSiGe for pFETs S. Yamakawa, S. Mayuzumi, D. Kosemura*, M. Takei*, J. Wang, Y. Tateshita, H. Wakabayashi, T. Ohno, A.Ogura, and H. Ansai 2008 International Conference on Simulation of Semiconductor Processes and Devices Hakone
08-11 2008年10月 Study on Stress Memorization by Argon Implantation and Annealing M. Hino K. Nagata, T. Yoshida, D. Kosemura, K. Kakushima, P. Ahmet, K. Tsutsui, N. Sugii, A. Ogura, T. Hattori and H. Iwai 214th Electrochemical Society Meeting Hawaii
08-12 2008年10月 Transconductance Enhancement of Strained <110> and <100> Si Nanowire Channel Field-Effect Transistors I. Tsuchida A. Seike, Y. Sugiura, D. Kosemura, A. Ogura and I. Ohdomari 214th Electrochemical Society Meeting Hawaii
08-13 2008年10月 Application of Synchrotron X-ray Diffraction Methods　to Gate Stacks of Advanced MOS devices T. Shimura T. Inoue, Y. Okamoto, T. Hosoi, H. Edo, S. Iida, A. Ogura, and H. Watanabe 214th Electrochemical Society Meeting Hawaii
08-14 2008年10月 Observation of Crystalline Imperfections in Supercritical Thickness Strained Silicon on Insulator Wafers by Synchrotron X-ray Topography T. Shimura T. Inoue, Y. Okamoto, T. Hosoi, H. Edo, S. Iida, A. Ogura, and H. Watanabe 214th Electrochemical Society Meeting Hawaii
08-15 2008年10月 Relationship between grain boundary structures and electrical property in polycrstaline Si for solar cells Koji Fukuda Hideaki Kawai, Koji Arafune, Yoshio Ohshita, Masafumi Yamaguchi, and Atushi Ogura Renewable Energy 2008 Pusan
08-16 2008年10月 New Analysis of Heavily Doped Boron and Arsenic in Shallow Junctions by X-ray Photoelectron Spectroscopy K. Tsutsui, M. Watanabe, Y. Nakagawa, T. Matsuda, T. Yoshida, E. Ikenaga, K. Kakushima, P. Ahmet, H. Nohira,T. Maruizumi, A. Ogura, T. Hattori and H. Iwai ESSDERC2008 Great Britein
08-17 2008年11月 A Comparative Study of the Electrical Characteristics of Sputtered TiN Gate Planar MOSFETs and FinFETs T. Hayashida Y. X. Liu, T. Matsukawa, K. Endo, S. O’uchi, K. Sakamoto, K. Ishii, J. Tsukada, Y. Ishikawa, H. Yamauchi, E. Suzuki, A. Ogura, and M. Masahara 2008 International Workshop on Dielectric Thin Films for Future ULSI Devices: Scieince and Technology Tokyo
08-18 2008年11月 Evaluation of Transconductance Enhancement of <110> and <100> -Channel Strained Si Nanowire Field-Effect Transistors" A. Seike Ikushin Tsuchida, Daisuke Kosemura, Atsushi Ogura, Takanobu Watanabe, and Iwao Ohdomari 2008 International Workshop on Dielectric Thin Films for Future ULSI Devices: Scieince and Technology Tokyo
08-19 2008年11月 Study of Strain Introduction in the Channel of MOSFET with　Transparent Dummy Gate and SiN Stressor Daisuke Kosemura Munehisa Takei, Kohki Nagata, Hiroaki Akamatsu, Masayuki　Kohno, Tatsuo Nishita, Toshio Nakanishi, and Atsushi Ogura The 5th International Conference on Advanced Science and Technology of Silicon Materials Hawaii
08-20 2008年11月 Micro-Raman study of channel strain in high performance　pFETs with compressive stress liner and eSiGe using　damascene gate technolog M.Takei D. Kosemura, S. Mayuzumi, A. Ogura The 5th International Conference on Advanced Science and Technology of Silicon Materials Hawaii
08-21 2008年11月 Evaluation of plasma etching damage in Si surface by　UV-Raman spectroscopy Hirotaka Kurozaki Daisuke Kosemura,Tetsuya Yoshida,Maki Hattori, Eiichi Nishimura, and Atsushi Ogura The 5th International Conference on Advanced Science and Technology of Silicon Materials Hawaii
08-22 2008年11月 The in-situ measurement of thermal expansion coefficient of thin SiGe layer on Si (001) by XRD Hirokazu Kambayashi Yu Yamamoto Masato Imai, Yoshiji Miyamura, Kazuhiko Omote, Takane Kobayashi, Atsushi Ogura The 5th International Conference on Advanced Science and Technology of Silicon Materials Hawaii
08-23 2008年11月 Behaviors of ultra thin SiGe layer by annealing Yu Yamamoto Hirokazu Kambayashi, Masato Imai, Yoshiji Miyamura, Kazuhiko Omote, Takane Kobayashi, Atsushi Ogura The 5th International Conference on Advanced Science and Technology of Silicon Materials Hawaii
08-24 2008年11月 Suppression of SiC Surface Roughening during High Temperature Annealing by Atmospheric Control S. Kinoshita A. Ogura The 5th International Conference on Advanced Science and Technology of Silicon Materials Hawaii
08-25 2008年11月 Investigation of Structural Defects in Strained Si Wafers by Synchrotron X-ray Topography Takayoshi Shimura Tomoyuki Inoue, Takuji Hosoi, Atsushi Ogura, Satoshi Iida, Masataka Umeno, and Heiji Watanabe The 5th International Conference on Advanced Science and Technology of Silicon Materials Hawaii
08-26 2008年12月 Ion Beam Irradiation to Type IV Collagen for Biologic Reactivity Yuichiro Shiga Atsushi Ogura, Hiroshi Toida, Rena Ujiie, and Yoshiaki Suzuki The IUMRS International Conference in Asia 2008 Aaichi

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