学術論文 20年〜					2020/4/21 更新
発行年月	タイトル	掲載紙名	第一著者	共著者	発行所	備考
2020年1月	Anisotropic biaxial stress evaluation in metal-organic chemical vapor deposition grown Ge1-xSnx mesa structure by oil-immersion Raman spectroscopy	Thin Solid Films 697, 137797(2020) .	Kazutoshi Yoshioka	Ryo Yokogawa, Atsushi Ogura	Elsevier B.V.	https://doi.org/10.1016/j.tsf.2020.137797
2020年2月	Width dependence of drain current and carrier mobility in gate-all-around multi-channel polycrystalline silicon nanowire transistors with 10nm width scale	Japanese Journal of Applied Physics 59, 021004 (2020).	Ki-Hyun Jang	Takuya Saraya, Masaharu Kobayashi, Naomi Sawamoto, Atsushi Ogura, and Toshiro Hiramoto	IOP Science	https://doi.org/10.35848/1347-4065/ab6f2c
2020年2月	Surface inversion layer effective minority carrier mobility as one of the measures of surface quality of the p-aSi:H/i-aSi:H/cSi heterojunction solar cell	Japanese Journal of Applied Physics 59, SGGF06 (2020).	Takefumi Kamioka	Yutaka Hayashi, Kazuhiro Gotoh, Ryo Ozaki, Kyotaro Nakamura, Motoo Morimura, Shimako Naitou, Noritaka Usami, Atsushi Ogura, and Yoshio Ohshita	IOP Science
2020年2月	Bipolar Transistor Test Structures for Extracting Minority Carrier Lifetime in IGBTs	IEEE Transactions on Semiconductor Manufacturing PP(99):1-1(2020).	Kiyoshi Takeuchi	Takuya Hoshii, Kazuyoshi Furukawa, Masahiro Watanabe, Hitoshi Wakabayashi, Kazuo Tsutsui, Hiroshi Iwai, Atsushi Ogura, Wataru Saito, Shin-ichi Nishizawa, Masanori Tsukuda, Munetoshi Fukui, Ichiro Omura, Hiromichi Ohashi, Toshiro Hiramoto, Takuya Saray, aKazuo Itou, Toshihiko Takakura, Shinichi Suzuki, Yohichiroh Numasawa, Naoyuki Shigyo, and Kuniyuki Kakushima	IEEE	10.1109/TSM.2020.2972369
2020年3月	The Physical and Chemical Properties of MoS2(1-x)Te2x Alloy Synthesized by Co-sputtering and Chalcogenization and Their Dependence on Fabrication Conditions		Yusuke Hibino	Kota Yamazaki, Yusuke Hashimoto, Yuya Oyanagi, Naomi Sawamoto, Hideaki Machida, Masato Ishikawa, Hiroshi Sudo, Hitoshi Wakabayashi, and Atsushi Ogura	Materials Research Society	DOI: 10.1557/adv.2020.170
2020年3月	Evaluation of MoS2 Films Fabricated by Metal-Organic Chemical Vapor Deposition Using a Novel Mo Precursor i-Pr2DADMo(CO)3 Under Various Deposition Conditions		K. Yamazaki	Y. Hibino, Y. Oyanagi, Y. Hashimoto, N. Sawamoto, H. Machida, M. Ishikawa, H. Sudo, H. Wakabayashi, and A. Ogura	Materials Research Society	DOI: 10.1557/adv.2020.187