国際会議 20年〜21年 2024/5/30 更新
発行年月 タイトル 第一著者 共著者 会議名 開催場所 備考
2020年3月2日 Effect of ZnxMn1-xS buffer layer for nonpolar AlN growth on Si(100) Substrate M. Morita K. Ishibashi, K. Takahashi, T. Chikyow, A. Ogura, and T. Nagata The 13th MANA International Symposium 2020 jointly with ICYS Tsukuba, Japan  
2020年3月2日 Comparison of Oxide TFT with  C-doped and C-free In2O3 Channels by ALD R. Kobayashi  T. Nabatame, K. Kurishima, T. Onaya, A. Ohi, N. Ikeda, T. Nagata, K. Tsukagoshi, and A. Ogura The 13th MANA International Symposium 2020 jointly with ICYS Tsukuba, Japan  
2020年6月30日 A combinatorial approach to the ferroelectric properties in HfxZr1-xO2 deposited by atomic layer deposition Jaidah Mohan Si Joon Kim, Heber Hernandez-Arriaga, Yong Chan Jung, Takashi Onaya, Harrison Sejoon Kim, Namhun Kim, Kihyun Kim, Atsushi Ogura, Rino Choi, Myung Mo Sung, Jiyoung Kim AVS 20th International Conference on Atomic Layer Deposition (ALD 2020)  Vertual  
2020年6月30日 The effect of oxygen source on ferroelectricity of atomic layer deposited Hf0.5Zr0.5O2 thin film Yong Chan Jung Jaidah Mohan, Harrison Sejoon Kim, Heber Hernandez-Arriga, Takashi Onaya,, Kihyun Kim, Namhun Kim, Si Joon Kim, Atsushi Ogura, Rino Choi, Jinho Ahn, and Jiyoung Kim AVS 20th International Conference on Atomic Layer Deposition (ALD 2020)  Vertual  
2020年6月30日 Ferroelectricity of 300° Low Temperature Fabricated HfxZr1−xO2 Thin Films by Plasma-Enhanced Atomic Layer Deposition using Hf/Zr Cocktail Precursor Takashi Onaya Takashi Onaya, Toshihide Nabatame, Yong Chan Jung, Heber Hernandez-Arriaga, Jaidah Mohan, Harrison Kim, Ava Khosravi, Naomi Sawamoto, Chang-Yong Nam, Esther H. R. Tsai, Takahiro Nagata, Robert M. Wallace, Jiyoung Kim, Atsushi Ogura AVS 20th International Conference on Atomic Layer Deposition (ALD 2020)  Vertual  
2020年7月1日 Ferroelectricity of 300°C Low Temperature Fabricated HfxZr1-xO2 Thin Films by Plasma-Enhanced Atomic Layer Deposition using Hf/Zr Cocktail Precursor Takashi Onaya Toshihide Nabatame, Yong Chan Jung, Heber Hernandez-Arriaga, Jaidah Mohan, Harrison Kim, Ava Khosravi, Naomi Sawamoto, Chang-Yong Nam, Esther H. R. Tsai, Takahiro Nagata, Robert M. Wallace, Jiyoung Kim, Atsushi Ogura AVS 20th International Conference on Atomic Layer Deposition (ALD 2020)  Vertual  
2020年9月28日 Inelastic X-ray Scattering Measurement on SiGeSn Polycrystalline Alloy Yosuke Shimura Kako Iwamoto, Ryo Yokogawa, Motohiro Tomita, Hirokazu Tatsuoka, Hiroshi Uchiyama, Atsushi Ogura 2020 International Conference on Solid State Devices and Materials Online, Japan  
2020年9月29日 Effect of Ion Irradiation on Thermal Conductivity along SiO2/Si Interface Evaluated by Molecular Dynamics Junya Takizawa Sylvia Yuk Yee Chung, Motohiro Tomita, Ryo Yokogawa, Atsushi Ogura, Takanobu Watanabe 2020 International Conference on Solid State Devices and Materials Online, Japan  
2020年9月29日 Chemical Structure of SiN Films Deposited on High Aspect Trench by Plasma Enhanced Atomic Layer Deposition Tappei Nishihara Ryo Yokogawa, Yuji Otsuki, Munehito Kagaya, Atsushi Ogura 2020 International Conference on Solid State Devices and Materials Online, Japan  
2020年12月17日 Possibility of Above 20nmThick HfxZr1-xO2/ZrO2 and HfxZr1-xO2/HfO2 Bilayers for High Polarization and Breakdown Voltage T. Onaya T. Nabatame, M. Inoue, Y. C. Jung, H. Hernandez Arriaga, J. Mohan, H. S. Kim, N. Sawamoto, T. Nagata, J. Kim, and A. Ogura 51st IEEE Semiconductor Interface Specialists Conference Online, Washington D.C.  
2021年4月9日 Evaluation of MoS2(1-x)Te2x fabricated by different bottom-up methods Yusuke Hibino Kota Yamazaki, Yusuke Hashimoto, Naomi Sawamoto, Hideaki Machida, Masato Ishikawa, Hiroshi Sudoh, Hitoshi Wakabayashi, Atsushi Ogura 5th IEEE Electron Devices Technology and Manufacturing Conference Chengdu, China & Online  
2021年4月11日 Phonon Properties of Group IV Materials for Thermoelectric Applications Atsushi Ogura Ryo Yokogawa 5th IEEE Electron Devices Technology and Manufacturing Conference Chengdu, China & Online Invited
2021年9月8日 Evaluation of Chemical Reaction at the Interface between Low-Temperature Curing Electrode Paste and High Mobility Transparent Conductive Oxide Film for Silicon Heterojunction Solar Cells Tappei Nishihara Kazuo Muramatsu, Kyotaro Nakamura, Yoshio Ohshita, Satoshi Yasuno, and Atsushi Ogura European PV Solar Energy Conference and Exhibition 2021 Online  
2021年10月14日 Effect of Growth Parameters on MoS2 Film Quality Deposited by Low-temperature MOCVD Using i-Pr2DADMo(CO)3 and (t-C4H9)2S2 Kirito Cho Kota Yamazaki, Yusuke Hibino, Yusuke Hashimoto, Hideaki Machida, Masato Ishikawa, Hiroshi Sudoh, Hitoshi Wakabayashi, Ryo Yokogawa, and Atsushi Ogura 240th ECS Meeting Online  
2021年10月14日 Evaluation of Mo(1-x)WxS Alloy Fabricated by Combinatorial Film Deposition Shusei Hanafusa Yusuke Hashimoto, Keiji Ishibashi, Yusuke Hibino, Kota Yamazaki, Ryo Yokogawa, Hitoshi Wakabayashi, Atsushi Ogura 240th ECS Meeting Online  
2021年10月14日 Evaluation of Chemical Bonding States in Multilayer Interconnect Structures for Thermal Management in Next Generation Very Large Scale Integration K. Sahara R. Yokogawa, T. Nishihara, N. Sawamoto, T. Zhan, T. Watanabe, and A. Ogura 240th ECS Meeting Online  
2021年10月14日 Anisotropic In-plane and Out-of-plane Strain Relaxation in Carbon-doped Silicon Nanowires Evaluated by X-ray Reciprocal Space Mapping K. Yoshioka  G. Ogasawara, K. Sahara, Y. Shibayama, I. Hirosawa, T. Watanabe, R. Yokogawa, and A. Ogura 240th ECS Meeting Online  
2021年10月14日 Optical Properties of Bulk SiGe in the near infrared Evaluated by Spectroscopic Ellipsometry Y. Shibayama R. Yokogawa, Y. Arai, I. Yonenaga, A. Ogura 240th ECS Meeting Online  
2021年10月14日 Evaluation of Chemical and Physical Conformality for SiNx Films Deposited on Trench Substrate by Atomic Layer Deposition Atsushi Ogura Ryo Yokogawa, Tappei Nishihara, Yuji Otsuki, Munehiro Kagaya 240th ECS Meeting Invited&
Online
 
2021年12月14日 Suppression of Residual Saw Marks After Etching on Silicon Wafers by High-precision Slicing Yutaka Hara Tappei Nishihara, Ryo Yokogawa, Kyotaro Nakamura, Yoshio Ohshita, Tomoyuki Kawatsu, Toshiki Nagai, Noboru Yamada, Yukio Miyashita, and Atsushi Ogura The 31st International PV Science and Engineering Conference (PVSEC-31) Sydney, Australia & Online  
2021年12月14日 Evluation of damage in crystalline Silicon substrate induecd by plasma enhanced chemical vapor deposition of amorphous silicon films Haruki Kojima Tappei Nishihara, Kazuhiro Gotoh, Noritake Usami, Tomohiko Hara, Yoshio Ohshita, Kyotaro Nakamura, and Atsushi Ogura The 31st International PV Science and Engineering Conference (PVSEC-31) Sydney, Australia & Online  
2021年12月14日 Incestigation of carrier selectice contact using two dimensional materials for solar cells Taiga Tsukushi Tappei Nishihara, Tomohiko Hara, Yoshio Ohshita, Satoshi Yasuno, and Atsushi Ogura The 31st International PV Science and Engineering Conference (PVSEC-31) Sydney, Australia & Online