国際会議 20年〜21年 | 2024/5/30 更新 | |||||
発行年月 | タイトル | 第一著者 | 共著者 | 会議名 | 開催場所 | 備考 |
2020年3月2日 | Effect of ZnxMn1-xS buffer layer for nonpolar AlN growth on Si(100) Substrate | M. Morita | K. Ishibashi, K. Takahashi, T. Chikyow, A. Ogura, and T. Nagata | The 13th MANA International Symposium 2020 jointly with ICYS | Tsukuba, Japan | |
2020年3月2日 | Comparison of Oxide TFT with C-doped and C-free In2O3 Channels by ALD | R. Kobayashi | T. Nabatame, K. Kurishima, T. Onaya, A. Ohi, N. Ikeda, T. Nagata, K. Tsukagoshi, and A. Ogura | The 13th MANA International Symposium 2020 jointly with ICYS | Tsukuba, Japan | |
2020年6月30日 | A combinatorial approach to the ferroelectric properties in HfxZr1-xO2 deposited by atomic layer deposition | Jaidah Mohan | Si Joon Kim, Heber Hernandez-Arriaga, Yong Chan Jung, Takashi Onaya, Harrison Sejoon Kim, Namhun Kim, Kihyun Kim, Atsushi Ogura, Rino Choi, Myung Mo Sung, Jiyoung Kim | AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) | Vertual | |
2020年6月30日 | The effect of oxygen source on ferroelectricity of atomic layer deposited Hf0.5Zr0.5O2 thin film | Yong Chan Jung | Jaidah Mohan, Harrison Sejoon Kim, Heber Hernandez-Arriga, Takashi Onaya,, Kihyun Kim, Namhun Kim, Si Joon Kim, Atsushi Ogura, Rino Choi, Jinho Ahn, and Jiyoung Kim | AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) | Vertual | |
2020年6月30日 | Ferroelectricity of 300° Low Temperature Fabricated HfxZr1−xO2 Thin Films by Plasma-Enhanced Atomic Layer Deposition using Hf/Zr Cocktail Precursor | Takashi Onaya | Takashi Onaya, Toshihide Nabatame, Yong Chan Jung, Heber Hernandez-Arriaga, Jaidah Mohan, Harrison Kim, Ava Khosravi, Naomi Sawamoto, Chang-Yong Nam, Esther H. R. Tsai, Takahiro Nagata, Robert M. Wallace, Jiyoung Kim, Atsushi Ogura | AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) | Vertual | |
2020年7月1日 | Ferroelectricity of 300°C Low Temperature Fabricated HfxZr1-xO2 Thin Films by Plasma-Enhanced Atomic Layer Deposition using Hf/Zr Cocktail Precursor | Takashi Onaya | Toshihide Nabatame, Yong Chan Jung, Heber Hernandez-Arriaga, Jaidah Mohan, Harrison Kim, Ava Khosravi, Naomi Sawamoto, Chang-Yong Nam, Esther H. R. Tsai, Takahiro Nagata, Robert M. Wallace, Jiyoung Kim, Atsushi Ogura | AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) | Vertual | |
2020年9月28日 | Inelastic X-ray Scattering Measurement on SiGeSn Polycrystalline Alloy | Yosuke Shimura | Kako Iwamoto, Ryo Yokogawa, Motohiro Tomita, Hirokazu Tatsuoka, Hiroshi Uchiyama, Atsushi Ogura | 2020 International Conference on Solid State Devices and Materials | Online, Japan | |
2020年9月29日 | Effect of Ion Irradiation on Thermal Conductivity along SiO2/Si Interface Evaluated by Molecular Dynamics | Junya Takizawa | Sylvia Yuk Yee Chung, Motohiro Tomita, Ryo Yokogawa, Atsushi Ogura, Takanobu Watanabe | 2020 International Conference on Solid State Devices and Materials | Online, Japan | |
2020年9月29日 | Chemical Structure of SiN Films Deposited on High Aspect Trench by Plasma Enhanced Atomic Layer Deposition | Tappei Nishihara | Ryo Yokogawa, Yuji Otsuki, Munehito Kagaya, Atsushi Ogura | 2020 International Conference on Solid State Devices and Materials | Online, Japan | |
2020年12月17日 | Possibility of Above 20nmThick HfxZr1-xO2/ZrO2 and HfxZr1-xO2/HfO2 Bilayers for High Polarization and Breakdown Voltage | T. Onaya | T. Nabatame, M. Inoue, Y. C. Jung, H. Hernandez Arriaga, J. Mohan, H. S. Kim, N. Sawamoto, T. Nagata, J. Kim, and A. Ogura | 51st IEEE Semiconductor Interface Specialists Conference | Online, Washington D.C. | |
2021年4月9日 | Evaluation of MoS2(1-x)Te2x fabricated by different bottom-up methods | Yusuke Hibino | Kota Yamazaki, Yusuke Hashimoto, Naomi Sawamoto, Hideaki Machida, Masato Ishikawa, Hiroshi Sudoh, Hitoshi Wakabayashi, Atsushi Ogura | 5th IEEE Electron Devices Technology and Manufacturing Conference | Chengdu, China & Online | |
2021年4月11日 | Phonon Properties of Group IV Materials for Thermoelectric Applications | Atsushi Ogura | Ryo Yokogawa | 5th IEEE Electron Devices Technology and Manufacturing Conference | Chengdu, China & Online | Invited |
2021年9月8日 | Evaluation of Chemical Reaction at the Interface between Low-Temperature Curing Electrode Paste and High Mobility Transparent Conductive Oxide Film for Silicon Heterojunction Solar Cells | Tappei Nishihara | Kazuo Muramatsu, Kyotaro Nakamura, Yoshio Ohshita, Satoshi Yasuno, and Atsushi Ogura | European PV Solar Energy Conference and Exhibition 2021 | Online | |
2021年10月14日 | Effect of Growth Parameters on MoS2 Film Quality Deposited by Low-temperature MOCVD Using i-Pr2DADMo(CO)3 and (t-C4H9)2S2 | Kirito Cho | Kota Yamazaki, Yusuke Hibino, Yusuke Hashimoto, Hideaki Machida, Masato Ishikawa, Hiroshi Sudoh, Hitoshi Wakabayashi, Ryo Yokogawa, and Atsushi Ogura | 240th ECS Meeting | Online | |
2021年10月14日 | Evaluation of Mo(1-x)WxS Alloy Fabricated by Combinatorial Film Deposition | Shusei Hanafusa | Yusuke Hashimoto, Keiji Ishibashi, Yusuke Hibino, Kota Yamazaki, Ryo Yokogawa, Hitoshi Wakabayashi, Atsushi Ogura | 240th ECS Meeting | Online | |
2021年10月14日 | Evaluation of Chemical Bonding States in Multilayer Interconnect Structures for Thermal Management in Next Generation Very Large Scale Integration | K. Sahara | R. Yokogawa, T. Nishihara, N. Sawamoto, T. Zhan, T. Watanabe, and A. Ogura | 240th ECS Meeting | Online | |
2021年10月14日 | Anisotropic In-plane and Out-of-plane Strain Relaxation in Carbon-doped Silicon Nanowires Evaluated by X-ray Reciprocal Space Mapping | K. Yoshioka | G. Ogasawara, K. Sahara, Y. Shibayama, I. Hirosawa, T. Watanabe, R. Yokogawa, and A. Ogura | 240th ECS Meeting | Online | |
2021年10月14日 | Optical Properties of Bulk SiGe in the near infrared Evaluated by Spectroscopic Ellipsometry | Y. Shibayama | R. Yokogawa, Y. A | 240th ECS Meeting | Online | |
2021年10月14日 | Evaluation of Chemical and Physical Conformality for SiNx Films Deposited on Trench Substrate by Atomic Layer Deposition | Atsushi Ogura | Ryo Yokogawa, Tappei Nishihara, Yuji Otsuki, Munehiro Kagaya | 240th ECS Meeting | Invited& Online |
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2021年12月14日 | Suppression of Residual Saw Marks After Etching on Silicon Wafers by High-precision Slicing | Yutaka Hara | Tappei Nishihara, Ryo Yokogawa, Kyotaro Nakamura, Yoshio Ohshita, Tomoyuki Kawatsu, Toshiki Nagai, Noboru Yamada, Yukio Miyashita, and Atsushi Ogura | The 31st International PV Science and Engineering Conference (PVSEC-31) | Sydney, Australia & Online | |
2021年12月14日 | Evluation of damage in crystalline Silicon substrate induecd by plasma enhanced chemical vapor deposition of amorphous silicon films | Haruki Kojima | Tappei Nishihara, Kazuhiro Gotoh, Noritake Usami, Tomohiko Hara, Yoshio Ohshita, Kyotaro Nakamura, and Atsushi Ogura | The 31st International PV Science and Engineering Conference (PVSEC-31) | Sydney, Australia & Online | |
2021年12月14日 | Incestigation of carrier selectice contact using two dimensional materials for solar cells | Taiga Tsukushi | Tappei Nishihara, Tomohiko Hara, Yoshio Ohshita, Satoshi Yasuno, and Atsushi Ogura | The 31st International PV Science and Engineering Conference (PVSEC-31) | Sydney, Australia & Online |